The application of critical shape metrology toward CD-SEM measurement accuracy on sub-60nm features

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5752, Issue I, 2005, Pages 489-498

  Foucher, J ^a   Sundaram, G ^b   Gorelikov, D V ^b  

^a CEA LETI   (France)

^b Soluris Inc   (United States)

Author keywords

Accuracy; AFM; CSM; Scatterometry; SEM

Indexed keywords

ALGORITHMS; ATOMIC FORCE MICROSCOPY; DIMENSIONAL STABILITY; MATHEMATICAL MODELS; MONTE CARLO METHODS; OPTICAL VARIABLES MEASUREMENT; SCANNING ELECTRON MICROSCOPY;

ACCURACY; AFM; CSM; SCATTEROMETRY;

MEASUREMENT THEORY;

EID: 24644513376     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.601068     Document Type: Conference Paper

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