CD SEM metrology Macro CD technology - Beyond the average

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5752, Issue I, 2005, Pages 111-126

  Bunday, Benjamin D ^a   Michelson, Di K ^a   Allgair, John A ^a   Tam, Aviram ^b   Chase Colin, David ^b   Dajczman, Asaf ^b   Adan, Ofer ^b   Har Zvi, Michael ^b  

^a SEMATECH   (United States)

^b Applied Materials Inc Israel   (Israel)

Author keywords

Applied Materials; CD Metrology; CD SEM; ISMI; Macro CD; Precision; SEMATECH; SPC; VeritySEM

Indexed keywords

DIMENSIONAL STABILITY; PROCESS CONTROL; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR DEVICE MANUFACTURE; STATISTICAL METHODS;

APPLIED MATERIALS; CD METROLOGY; CD-SEM; ISMI; MACRO CD; PRECISION; SEMATECH; SPC; VERITYSEM;

MEASUREMENT THEORY;

EID: 24644463218     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.600133     Document Type: Conference Paper

References (5)

1. Bunday, B., Singh, B., Archie, C., Banke, W., Hartig, C., Cao, G., Villarrubia, J., and Vladar, A. 2004. Unified Advanced CD-SEM Specification for Sub-90 nm Technology (2004 Version). Sematech Technology Transfer document # 04114595. Non-confidential document. The specification can be viewed at www.sematech.org.
2. International Technology Roadmap for Semiconductors, 2004 Edition, http://member.itrs.net.
3. B. Bunday, M. Bishop, and J. Allgair, 2004. "Results of Benchmarking of Advanced CD-SEMs at the 90 nm CMOS Technology Node," Proceedings of SPIE, v5375, pp 151-172.
4. Eric W. Weisstein. "Standard Deviation Distribution." From MathWorld-A Wolfram Web Resource. http://mathworld.wolfrarn.com/ StandardDeviationDistribution.html
5. ISMI Statistical Methods training material, Implementing SPC Charts.