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Chemical Physics Letters

Volumn 402, Issue 1-3, 2005, Pages 37-42

Threshold ionization mass spectrometry study of hydrogenated amorphous carbon films growth precursors

(5) Benedikt, J a,c Eijkman, D J a Vandamme, W a Agarwal, S b Van De Sanden, M C M a

a EINDHOVEN UNIVERSITY OF TECHNOLOGY (Netherlands)

b University of Massachusetts (United States)

c RUHR UNIVERSITY BOCHUM (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

HYDROGENATED AMORPHOUS CARBON FILMS; RADICAL DENSITIES; THERMAL PLASMA; THRESHOLD IONIZATION MASS SPECTROMETRY;

CARBON; DEPOSITION; FREE RADICALS; HYDROGENATION; IONIZATION; MASS SPECTROMETRY;

AMORPHOUS FILMS;

CARBON;

ARTICLE; CALIBRATION; FILM; HYDROGENATION; IONIZATION; MASS SPECTROMETRY; MOLECULAR DYNAMICS; THERMAL ANALYSIS;

EID: 11444255278 PISSN: 00092614 EISSN: None Source Type: Journal
DOI: 10.1016/j.cplett.2004.12.005 Document Type: Article

Times cited : (33)

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