EUV testing of multilayer mirrors: Critical issues

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6151 I, Issue , 2006, Pages

  Hill, S B ^a   Ermanoski, I ^a   Grantham, S ^a   Tarrio, C ^a   Lucatorto, T B ^a   Madey, T E ^b   Bajt, S ^c   Chandhok, M ^d   Yan, P ^d   Wood, O ^e   Wurm, S ^e   Edwards, N V ^e  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b RUTGERS UNIVERSITY   (United States)

^c LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

^d INTEL CORPORATION   (United States)

^e SEMATECH   (United States)

Author keywords

EUV optics; Extreme ultraviolet; Lifetime testing; Lithography; Reflectometry; Ruthenium films

Indexed keywords

EUV OPTICS; EXTREME ULTRAVIOLET; LIFETIME TESTING; RUTHENIUM FILMS;

HYDROCARBONS; IRRADIATION; LITHOGRAPHY; MULTILAYERS; PARTIAL PRESSURE; VAPORS;

MIRRORS;

EID: 33745611096     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.656502     Document Type: Conference Paper

References (9)

1. L. R. Canfield and N. Swanson, "Far ultraviolet detector standards", J. Res. NBS 92, 97-112 (1987).
2. C. Tarrio, R. N. Watts, T. B. Lucatorto, M. Haass, T. A. Calcott, and J. Jia, "New NIST/DARPA National Soft X-ray Reflectometry Facility", J. X-ray Sci. Tech. 4, 96 (1994).
3. C. Tarrio and S. Grantham, "A synchrotron beamline for extreme-ultraviolet multilayer mirror endurance testing", submitted to Rev. Sci. Instrum.
4. S. Bajt, H.N. Chapman, N. Nguyen, J. Alameda, J.C. Robinson, M. Malinowski, E. Gullikson, A. Aquila, C. Tarrio and S. Grantham, "Design and performance of capping layers for extreme-ultraviolet multilayer mirrors", Applied Optics 42, 5750 (2003).
5. L.E. Klebanoff, M.A. Malinowski, W.M. Clift, C. Steinhaus, and P. Grunow, "Use of gas-phase ethanol to mitigate extreme UV/water oxidation of extreme UV optics", J. Vac. Sci. Technol. A22(2), 425 (2004).
6. T. E. Madey, "Summary Abstract: Surface phenomena and their influence on ultrahigh vacuum gauges," J. Vac. Sci. Technology A5, 3249 (1987)
7. J. T. Yates, Jr., "Experimental innovations in surface science", AIP Press, Springer, New York, 1998.
8. T. E. Madey, N. S. Faradzhev, B. V. Yakshinskiy and N. V. Edwards "Surface phenomena related to mirror degradation in extreme ultraviolet (EUV) lithography" Appl. Surf. Sci. (2006) in press
9. M. Malinowski, C. Steinhaus, M. Clift, L.E. Klebanoff, S. Mrowka, and R. Soufli, "Controlling Contamination in Mo/Si Multilayer Mirror by Si Surface-capping Modifications", Proceeding of SPIE, 4688, 442 (2002).