Progress in EUV optics lifetime expectations

Microelectronic Engineering

Volumn 73-74, Issue , 2004, Pages 16-22

  Mertens, Bas ^a   Weiss, Markus ^b   Meiling, Hans ^c   Klein, Roman ^d   Louis, Eric ^e   Kurt, Ralph ^f   Wedowski, Marco ^b   Trenkler, Hans ^b   Wolschrijn, Bas ^a   Jansen, Rik ^a   Van De Runstraat, Annemieke ^a   Moors, Roel ^c   Spee, Karel ^a   Plöger, Sven ^d   Van De Kruijs, Robbert ^e  

^a TNO   (Netherlands)

^b CARL ZEISS SMT AG   (Germany)

^c ASML   (Netherlands)

^d PHYSIKALISCH TECHNISCHE BUNDESANSTALT   (Germany)

^e FOM INSTITUTE FOR PLASMA PHYSICS RIJNHUIZEN   (Netherlands)

^f PHILIPS RESEARCH LABORATORIES   (Netherlands)

Author keywords

Cap layers; Carbon growth; EUV lithography; Optics lifetime; Oxidation

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; CARBON; CRACK INITIATION; HYDROCARBONS; IMAGING TECHNIQUES; LITHOGRAPHY; MICROOPTICS; MIRRORS; OPTICAL SYSTEMS; OXIDATION;

CAP LAYERS; CARBON GROWTH; EUV LITHOGRAPHY; OPTICS LIFETIME;

ULTRAVIOLET RADIATION;

EID: 18544398501     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(04)00066-8     Document Type: Conference Paper

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