Multilayer reflectance during exposure to EUV radiation

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4146, Issue 1, 2000, Pages 64-71

  Oestreich, Sebastian ^a   Klein, Roman ^b   Scholze, Frank ^b   Jonkers, Jeroen ^c   Louis, Eric ^a   Yakshin, Andrey ^a   Gorts, Peter ^a   Ulm, Gerhard ^b   Haidl, Markus ^d   Bijkerk, Fred ^a  

^a FOM INSTITUTE FOR PLASMA PHYSICS RIJNHUIZEN   (Netherlands)

^b PHYSIKALISCH TECHNISCHE BUNDESANSTALT   (Germany)

^c PHILIPS RESEARCH LABORATORIES   (Netherlands)

^d CARL ZEISS SMT AG   (Germany)

Author keywords

EUV optics; Extreme ultraviolet lithography; Hydrocarbon contamination; Multilayer mirrors; Ozone cleaning; Surface contamination

Indexed keywords

ATMOSPHERIC PRESSURE; HYDROCARBONS; MIRRORS; MONOCHROMATORS; OPTICAL MULTILAYERS; OZONE; REFLECTION; VACUUM;

VACUUM PRESSURES;

ULTRAVIOLET RADIATION;

EID: 0005383679     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.406677     Document Type: Article

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