Radiation-induced protective carbon coating for extreme ultraviolet optics

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 20, Issue 2, 2002, Pages 696-703

  Klebanoff, L E ^a   Clift, W M ^a   Malinowski, M E ^a   Steinhaus, C ^a   Grunow, P ^a   Bajt, S ^b  

^a SANDIA NATIONAL LABORATORIES   (United States)

^b LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; CARBON; DEGRADATION; GASIFICATION; LITHOGRAPHY; MULTILAYERS; OXIDATION; PARTIAL PRESSURE; PHOTONS; ULTRAVIOLET RADIATION;

EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY; SPUTTER AUGER DEPTH PROFILING;

PROTECTIVE COATINGS;

EID: 0036504791     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1463726     Document Type: Article

References (14)