From speculation to specification: A discussion on how to define the tolerance of LER/LWR and its measurement methodology

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6152 II, Issue , 2006, Pages

  Yamaguchi, Atsuko ^a   Steffen, Robert ^b   Kawada, Hiroki ^b   Iizumi, Takashi ^b   Sugimoto, Aritoshi ^b  

^a HITACHI LTD   (Japan)

^b HITACHI HIGH TECHNOLOGIES CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; MEASUREMENT ERRORS; MEASUREMENTS; SCANNING ELECTRON MICROSCOPY; SPECIFICATIONS; SPECTRUM ANALYSIS; SURFACE ROUGHNESS; TRANSISTORS;

CRITICAL DIMENSION; LINEWIDTH ROUGHNESS (LWR); RANDOM IMAGE NOISE; THRESHOLD-VOLTAGE VARIATION;

MOSFET DEVICES;

EID: 33745587279     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.656055     Document Type: Conference Paper

References (26)

1. Hyun-Woo Kim, Ji-Young Lee, Jangho Shin, Sang-Gyun Woo, Han-Ku Cho, and Joo-Tae Moon, IEEE Transactions on Electron Devices, vol. 51, 1984(2004).
2. P. Oldiges, Q. Lin, K. Petrillo, M. Sanchez, M. leong, and M. Hargrove, SISPAD 2000, 131(2000).
3. K. Patterson, J. L. Sturtevant, J. Alvis, N. Benavides, D. Bonser, N. Cave, C. Nelson-Thomas, B. Taylor, K. Tumquest, Proc. SPIE, vol. 4344, 809(2001).
4. K. K. Young, S. Y. Wu, C. H. Wang, C. T. Lin, J. Y. Cheng, M. Chiang, S. H. Chen, T. C. Lo, Y. S. Chen, J. H. Chen, L. J. Chen, S. Y. Hou, J. J. Liaw, T. E. Chang, C. S. Hou, J. Shih, S. M. Jeng, H. C. Hsieh, Y. Ku, T. Yen, H. Tao, L. C. Chao, S. Shue, S. M. Jang, T. C. Ong, C. H. Yu, M. S. Liang, C. H. Diaz, and J. Y. C. Sun, IEDM Tech. Dig. 2000, 563(2000).
5. C. H. Diaz, H. Tao, Y. Ku, A. Yen, and K. Young, IEEE Electron Device Letters, vol. 22, 287(2001).
6. S. Xiong, J. Bokor, Q. Xiang, P. Fisher, I. Dudley, and P Rao, Proc. SPIE vol. 4689, 733(2002).
7. T. Linton, M. Chandhok, B. J. Rice, and G. Schrom, IEDM Tech. Dig. 2002, 303(2002).
8. J. A. Croon, G. Storms, S. Winkelmeier, I. Pollentier, M. Ercken, S. Decoutere, Q. Sansen, and H. E. Maes, IEDM Tech. Dig. 2002, 307(2002).
9. K. Shibata, N. Izumi, and K. Tsujita, Proc. SPIE, vol. 5375 865(2004).
10. A. Yamaguchi, R. Tsuchiya, H. Fukuda, O. Komuro. H. Kawada, and T. lizumi, Proc. SPIE vol. 5038, 689(2003).
11. A. Yamaguchi, K. Ichinose, S. Shimamoto, H. Fukuda, R. Tsuchiya, K. Ohnishi, H. Kawada, and T. Iizumi, Proc. SPIE vol. 5375, 468(2004).
12. J. Y. Lee, J. Shin, H. W. Kim, S. G. Woo, H. K. Cho, W. S. Han, and J. T. Moon, Proc. SPIE vol. 5376, 426(2004).
13. S. Xiong, J. Bokor, Q. Xiang, P. Fisher, I. Dudley, P. Rao, H. Wang, and B. En, IEEE Trans. Semiconductor Manufacturing vol. 17, 357(2004).
14. H. Fukutome, Y. Momiyama, T. Kubo, Y. Tagawa, T. Aoyama, and H. Arimoto, IEDM Tech. Dig. 2004, 433(2004).
15. W. Steinhogl, G. Schindler, G. Steinlesberger, M. Traving and M. Engelhalt, Microelectronic Engineering, vol. 76, 126(2004).
16. J. Noguchi, T. Ohshima, U. Tanaka, K. Sasajima, H. Aoki, K. Sato, K. Ishikawa, T. Saito, N. Konishi, S. Hotta, S. Uno and K. Kikushima, IEDM Tech. Dig. 2003, 21.6.1(2003).
17. L. H. A. Leunissen, W. Zhang and W. Wu, Abstracts of The 49th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication, 289(2005).
18. V. Constantoudis, G. P. Pastis, and E. Gogolodes, Proc. SPIE, vol. 5038, 901(2003).
19. L. H. A. Leunissen, W. G. Lawrence, and M. Ercken, Micro-elecronic Engineering, vol. 73, 265(2004).
20. B. D. Bunday, M. Bishop, D. McCormack, J. S. Villarrubia, A. E. Vladar, R. Dixon, T. Vorburger, and N. G. Orji, Proc. SPIE, vol. 5375, 515(2004).
21. for example, A. Yamaguchi, H. Fukuda, H. Kawada, and T. Iizumi, J. Photopolym. Sci. Technol., vol. 16, 387(2003).
22. ITRS2003, http://public.itrs.net/Files/2003ITRS/Home2003.htm
23. J. S. Villarrubia and B. D. Bunday, Proc. SPIE, 5752, 480(2005).
24. A. Yamaguchi, H. Fukuda, T. Arai, J. Yamamoto, T. Hirayama, D. Shiono, H. Hada and J. Onodera, J. Vac. Sci. Technol. B in press.
25. M. Hane. T. Ikezawa, ant T. Ezaki, IEDM Tech. Digs, 241(2003).
26. M. Hane, T. Ikezawa and T. Ezaki, Mat. res. Soc. Symp. Proc. Vol.810 269(2004).