Photo-resist line-edge roughness analysis using scaling concepts

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5038 II, Issue , 2003, Pages 901-909

  Constantoudis, Vassilios ^a   Patsis, George P ^a   Gogolides, Evangelos ^a  

^a INSTITUTE OF MICROELECTRONICS   (Greece)

Author keywords

Correlation length; Edge de tection; Fractal dimension; Line edge roughness; Line width roughness; Noise smoothing filters; Photoresist; Roughness exponent; Scal ing analysis; Scanning electron microscope images

Indexed keywords

ALGORITHMS; EDGE DETECTION; FRACTALS; IMAGE ANALYSIS; SCANNING ELECTRON MICROSCOPY; SPATIAL VARIABLES MEASUREMENT; SURFACE ROUGHNESS;

CORRELATION LENGTH; LINE EDGE ROUGHNESS; LINE WIDTH ROUGHNESS; NOISE SMOOTHING FILTERS; OFFLINE IMAGE ANALYSIS ALGORITHMS; SCALING ANALYSIS; SPATIAL COMPLEXITY;

PHOTORESISTS;

EID: 0141834954     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.482809     Document Type: Conference Paper

References (12)

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