Contour lithography methods for DRIE fabrication of nanometre-millimetre- scale coexisting microsystems

Journal of Micromechanics and Microengineering

Volumn 16, Issue 6, 2006, Pages

  Mita, Yoshio ^a   Kubota, Masanori ^a   Harada, Tomoyuki ^a   Marty, Frédéric ^b   Saadany, Bassam ^b   Bourouina, Tarik ^b   Shibata, Tadashi ^a  

^a UNIVERSITY OF TOKYO   (Japan)

^b Ecole Superieure d'Ingenieurs en Electronique et Electrotechnique   (France)

Author keywords

[No Author keywords available]

Indexed keywords

MICROELECTROMECHANICAL DEVICES; NANOSTRUCTURED MATERIALS; OPTICAL FILTERS; PASSIVATION; PROBLEM SOLVING; REACTIVE ION ETCHING;

CONTOUR LITHOGRAPHY; DEEP REACTIVE ION ETCHING (DRIE); NANO-SIZE OPENINGS;

PHOTOLITHOGRAPHY;

EID: 33646716472     PISSN: 09601317     EISSN: 13616439     Source Type: Journal    
DOI: 10.1088/0960-1317/16/6/S20     Document Type: Article

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