Optical characteristics of one-dimensional photonic crystals composed of high-aspect-ratio Si walls fabricated on V-grooved wafer

Photonics and Nanostructures - Fundamentals and Applications

Volumn 4, Issue 1, 2006, Pages 30-34

  Hosomi, Kazuhiko ^a,b,c   Fukamachi, Toshihiko ^a,b,c   Yamada, Hiroji ^a   Katsuyama, Toshio ^a,b   Arakawa, Yasuhiko ^a  

^a UNIVERSITY OF TOKYO   (Japan)

^b OITDA ^*  (Japan)

^c HITACHI LTD   (Japan)

Author keywords

Cryogenic etching; High aspect ratio etching; Microcavity; One dimensional photonic crystal

Indexed keywords

ETCHING; OPTICAL DEVICES; OPTICAL FIBERS; OPTICAL PROPERTIES; PHOTONS; SILICON WAFERS;

CRYOGENIC ETCHING; HIGH-ASPECT-RATIO ETCHING; MICROCAVITY; ONE-DIMENSIONAL PHOTONIC CRYSTAL;

CRYSTALS;

EID: 31444438671     PISSN: 15694410     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.photonics.2005.11.005     Document Type: Article

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