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Volumn 13, Issue 1, 2004, Pages 19-30

Multilevel beam SOI-MEMS fabrication and applications

Author keywords

Deep reactive ion etch (DRIE); Inductively coupled plasma (ICP) etch; Microfabrication; Micromirrors; Optical MEMS; Self alignment; SOI MEMS; Vertical combdrives

Indexed keywords

DEGREES OF FREEDOM (MECHANICS); INDUCTIVELY COUPLED PLASMA; MASKS; MICROELECTROMECHANICAL DEVICES; OPTIMIZATION; REACTIVE ION ETCHING; SILICON ON INSULATOR TECHNOLOGY; SINGLE CRYSTALS;

EID: 1542604570     PISSN: 10577157     EISSN: None     Source Type: Journal    
DOI: 10.1109/JMEMS.2003.823226     Document Type: Article
Times cited : (77)

References (24)
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    • M. C. Wu, L. Y. Lin, S. S. Lee, and C. R. King, "Free-space integrated optics realized by surface-micromachining," Int. J. High Speed Electron. Syst., vol. 8, no. 2, pp. 283-297, Feb. 1997.
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  • 6
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    • Electrostatic model for an asymmetric vertical combdrive
    • Mar.
    • J.-L. A. Yeh, C.-Y. Hui, and N. C. Tien, "Electrostatic model for an asymmetric vertical combdrive," J. Microelectromech. Syst., vol. 9, Mar. 2000.
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    • Yeh, J.-L.A.1    Hui, C.-Y.2    Tien, N.C.3
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    • Characterization of a time multiplexed inductively coupled plasma etcher
    • Jan.
    • A. A. Ayon, R. Braff, C. C. Lin, H. H. Sawin, and M. A. Schmidt, "Characterization of a time multiplexed inductively coupled plasma etcher," J. Electrochem. Soc., vol. 146, no. 1, pp. 339-49, Jan. 1999.
    • (1999) J. Electrochem. Soc. , vol.146 , Issue.1 , pp. 339-349
    • Ayon, A.A.1    Braff, R.2    Lin, C.C.3    Sawin, H.H.4    Schmidt, M.A.5
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    • Large-displacement vertical microlens scanner with low driving voltage
    • Nov.
    • S. Kwon, V. Milanović, and L. P. Lee, "Large-displacement vertical microlens scanner with low driving voltage," IEEE Photon. Technol. Lett., vol. 14, pp. 1572-1574, Nov. 2002.
    • (2002) IEEE Photon. Technol. Lett. , vol.14 , pp. 1572-1574
    • Kwon, S.1    Milanović, V.2    Lee, L.P.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.