Reshaping technology with Joule heat for three dimensional silicon structures

International Conference on Solid-State Sensors and Actuators, and Eurosensors IX, Proceedings

Volumn 1, Issue , 1995, Pages 174-177

  Fukuta, Yamato ^a   Akiyama, Terunobu ^a   Fujita, Hiroyuki ^a  

^a UNIVERSITY OF TOKYO   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CHEMICAL VAPOR DEPOSITION; FABRICATION; HEATING; MICROMACHINING; PLASTIC DEFORMATION; REACTIVE ION ETCHING; SEMICONDUCTING SILICON; SEMICONDUCTOR PLASMAS; SUBSTRATES; SURFACES; THREE DIMENSIONAL;

ANISOTROPIC REACTIVE ION ETCHING; ANNEALING EFFECTS; JOULE HEATING; LOW PRESSURE CHEMICAL VAPOR DEPOSITION; POLY BORON FILM; STRUCTURE DEFORMATION MEASUREMENTS; SURFACE MICROMACHINING TECHNOLOGY;

MICROSTRUCTURE;

EID: 0029543022     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (7)