Silicon angular resonance gyroscope by deep ICPRIE and XeF2 gas etching

Proceedings of the IEEE Micro Electro Mechanical Systems (MEMS)

Volumn , Issue , 1998, Pages 322-327

  Choi, Jae joon ^a   Toda, Risaku ^a   Minami, Kazuyuki ^a   Esashi, Masayoshi ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC EXCITATION; ELECTROSTATICS; MICROMACHINING; REACTIVE ION ETCHING; RESONANCE; SENSITIVITY ANALYSIS; SILICON; VIBRATIONS (MECHANICAL);

ANGULAR RESONANCE SILICON GYROSCOPE; GAS ETCHING; GLASS SILICON GLASS STRUCTURES;

GYROSCOPES;

EID: 0031651045     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (4)