Exposing extreme ultraviolet lithography at Intel

Microelectronic Engineering

Volumn 83, Issue 4-9 SPEC. ISS., 2006, Pages 672-675

  Roberts, Jeanette ^a   Bacuita, Terence ^a   Bristol, Robert L ^a   Cao, Heidi ^a   Chandhok, Manish ^a   Lee, Sang H ^a   Leeson, Michael ^a   Liang, Ted ^a   Panning, Eric ^a   Rice, Bryan J ^a   Shah, Uday ^a   Shell, Melissa ^a   Yueh, Wang ^a   Zhang, Guojing ^a  

^a INTEL CORPORATION   (United States)

Author keywords

Etch; EUV; EUVL; Extreme ultraviolet lithography; Micro exposure tool; Patterning; Resist

Indexed keywords

DATA ACQUISITION; DEFECTS; IMAGE PROCESSING; OPTICAL RESOLVING POWER; ULTRAVIOLET RADIATION;

EUV; EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL); MICRO-EXPOSURE TOOL; MICRO-EXPOSURE TOOL (MET); PATTERNING;

LITHOGRAPHY;

EID: 33646040135     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2005.12.037     Document Type: Article

References (21)

1. Silverman P.J. Journal of Microlithography, Microfabrication, and Microsystems 4 (2005) 011006-1
2. Attwood D.T. Soft X-rays and Extreme Ultraviolet Radiation: Principles and Applications (1999), Cambridge University Press, New York
3. Bjorkholm J.E. Intel Technology Journal 2 (1998)
4. Bjorkholm J.E., Bokor J., Eichner L., et al. Journal of Vacuum Science and Technology B 8 (1990) 1509-1513
5. Kinoshita H., Kurihara K., Ishii Y., et al. Journal of Vacuum Science and Technology B 7 (1989) 1648-1651
6. Goldsmith J.E.M., Barr P.K., Berger K.W., et al. Proceedings of the SPIE 3331 (1998) 11-19
7. Tichenor D.A., Ray-Chaudhuri A.K., Replogle W.C., et al. Proceedings of the SPIE 4343 (2001) 19-37
8. Naulleau P., Goldberg K.A., Anderson E., et al. Proceedings of the SPIE 5751 (2005) 56-63
9. Roberts J.M., Bacuita T., Bristol R.L., et al. Proceedings of the SPIE 5751 (2005) 64-77
10. Cao H.B., Yueh W., Roberts J., et al. Proceedings of the SPIE 5753 (2005) 459-466
11. Booth M., Brisco O., Brunton A., et al. Proceedings of the SPIE 5751 (2005) 78-89
12. P. Kurz, H.J. Mann, M. Antoni, et al., Optics for EUV lithography, Digest of Papers 2000, in: International Microprocesses and Nanotechnology Conference (IEEE Cat. No. 00EX387), Tokyo, Japan, 2000.
13. Stamm U., Kleinschmidt J., Gabel K., et al. Proceedings of the SPIE 5751 (2005) 236-247
14. Gaebel K.M., Kleinschmidt J., Schriever G., et al. Proceedings of the SPIE 5063 (2003) 256-264
15. Schriever G., Rahe M., Stamm U., et al. Proceedings of the SPIE 4343 (2001) 615-620
16. Chandhok M., Lee S.H., and Bacuita T. Journal of Vacuum Science and Technology B 22 (2004) 2966-2969
17. Chandhok M., Lee S.H., Roberts J., et al. Journal of Vacuum Science and Technology B 24 (2006) 274-278
18. Lee S.H., Chandhok M., Roberts J., et al. Proceedings of the SPIE 5751 (2005) 293-300
19. Cardinale G.F., Henderson C.C., Goldsmith J.E.M., et al. Journal of Vacuum Science and Technology B 17 (1999) 2970-2974
20. Rao V., Cobb J.L., Henderson C.C., et al. Proceedings of the SPIE 3676 (1999) 615-626
21. Stivers A.R., Yan P.-Y., Zhang G., et al. Proceedings of the SPIE 5567 (2004) 13-22