EUV mask pilot line at intel corporation

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5567, Issue PART 1, 2004, Pages 13-22

  Stivers, Alan R ^a   Yan, Pei Yang ^a   Zhang, Guojing ^a   Liang, Ted ^a   Shu, Emily Y ^a   Tejnil, Edita ^a   Lieberman, Barry ^a   Nagpal, Rajesh ^a   Hsia, Kangmin ^a   Penn, Michael ^a   Lo, Fu Chang ^a  

^a INTEL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY; INTEL CORPORATION (CO); INTERNATIONAL SEMATECH (CO); SEMICONDUCTOR SCALING; WAVELENGTH;

MICROELECTRONICS; OPTICAL BEAM SPLITTERS; OPTICAL DESIGN; PHOTOLITHOGRAPHY; PROJECTION SYSTEMS; SEMICONDUCTOR DEVICE MANUFACTURE; ULTRAVIOLET RADIATION; VACUUM;

MASKS;

EID: 21144484432     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.569176     Document Type: Conference Paper

References (20)

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2. th Annual BACUS Symposium on Photomask Technology, Proc. SPIE Vol. 5567, Wolfgang Staud, J. Tracy Weed (eds.), paper 5567-83, 2004.
3. T. Shoki, M. Hosoya, T. Kinoshita, H. Kobayashi, Y. Usui, R. Ohkubo, S. Ishibashi and O. Nagarekawa, "Process development of a 6-inch EUV mask with TaBN absorber," in Photomask and Next-Generation Lithography Mask Technology IX, Proc. SPIE Vol. 4754, Hiroichi Kawahira (ed.), pp. 857-64, 2002.
4. nd Annual BACUS Symposium on Photomask Technology, Proc. SPIE Vol. 4889, Brian J. Grenon, Kurt R. Kimmel(eds.), pp. 408-17, 2002.
5. th Annual BACUS Symposium on Photomask Technology, Proc. SPIE Vol. 5567, Wolfgang Staud, J. Tracy Weed (eds.), paper 5567-88, 2004.
6. See Lasertec M1320 data sheet at http://www.lasertec.co.jp/products/sis/ M1320/e-index.html.
7. S. Hector and K. Kemp, "EUVL mask challenges and how International SEMATECH is addressing them," in Photomask and Next-Generation Lithography Mask Technology XI, Proc. SPIE Vol. 5446, Masanori Komuro, (ed.), paper 5446-119, 2004.
8. rd Annual BACUS Symposium on Photomask Technology, Proc. SPIE Vol. 5256, Kurt R. Kimmel, Wolfgang Staud (eds.), pp. 556-65, 2003.
9. T. Liang and A. Stivers, "Damage-free mask repair using electron beam induced chemical reactions," in Emerging Lithographic Technologies VI, Proc. SPIE Vol. 4688, Roxanne L. Englestad (ed.), pp. 375-84, 2002.
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11. th Annual BACUS Symposium on Photomask Technology, Proc. SPIE Vol. 5567, Wolfgang Staud, J. Tracy Weed (eds.), paper 5567-49, 2004.
12. D. Pettibone, A. Dayal, A. Veldman, and S. Stokowski, "Ultraviolet and direct ultraviolet inspection of next generation lithography reticles," J. Vac. Sci. Technol. B, Vol. 20, p. 3006, 2002.
13. nd Annual BACUS Symposium on Photomask Technology, Proc. SPIE Vol. 4889, Brian J. Grenon, Kurt R. Kimmel(eds.), pp. 1065-72, 2002.
14. See ATP project summary at http://jazz.nist.gov/atpcf/prjbriefs/prjbrief. cfm?ProjectNumber=98-06-0057.
15. E. M. Gullikson, S. Mrowka, and B. B. Kaufmann, "Recent Developments in EUV Reflectometry at the Advanced Light Source," in Emerging Lithographic Technologies V, Proc. SPIE Vol. 4343, Elizabeth A. Dobisz (ed.), pp. 363-73, 2001.
16. st Annual BACUS Symposium on Photomask Technology, Proc. SPIE, vol.4562, pp. 863-82, 2002.
17. R. Martino, R. Ferguson, R. Budd, J. Staples, L. Liebmann, A. Molless, D. Dove, and J. Weed, "Application of the aerial image measurement system (AIMS) to the analysis of binary mask imaging and resolution enhancement techniques," in Optical and Laser Microlithography VII, Proc. SPIE Vol. 2197, Brian J. Grenon, Kurt R. Kimmel(eds.), pp. 573-84, 1994.
18. P.-Y. Yan and C. Wagner, "EUVL ML blank fiducial mark generation via local heating," in Emerging Lithographic Technologies VIII, Proc. SPIE Vol. 5374, R. Scott Mackay (ed.), pp. 254-60, 2004.
19. nd Annual BACUS Symposium on Photomask Technology, Proc. SPIE Vol. 4889, Brian J. Grenon, Kurt R. Kimmel(eds.), pp. 1073-1084, 2002.
20. th Annual BACUS Symposium on Photomask Technology, Proc. SPIE Vol. 5567, Wolfgang Staud, J. Tracy Weed (eds.), paper 5567-169, 2004.