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Volumn 5751, Issue I, 2005, Pages 293-300

Characterization of flare on Intel's EUV MET

Author keywords

EUV; Flare; FVC; MET; MSFR; Point Spread Function; PSD; PSF; Scatter

Indexed keywords

EUV; FLARE; FVC; MET; MSFR; PSD; PSF; SCATTER;

EID: 24644496629     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.600154     Document Type: Conference Paper
Times cited : (14)

References (14)
  • 14
    • 24644450119 scopus 로고    scopus 로고
    • EUV micro exposures at the ALS using the 0.3NA MET projection optics
    • Emerging Lithographic Technologies IX, (submitted)
    • P. Naulleau, et al, "EUV Micro Exposures at the ALS Using the 0.3NA MET Projection Optics,"Emerging Lithographic Technologies IX, Proceeding of SPIE vol. 5751, (submitted 2005).
    • (2005) Proceeding of SPIE , vol.5751
    • Naulleau, P.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.