Demonstration of pattern transfer into sub-100 nm polysilicon line/space features patterned with extreme ultraviolet lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 17, Issue 6, 1999, Pages 2970-2974

  Cardinale, G F ^a   Henderson, C C ^a   Goldsmith, J E M ^a   Mangat, P J S ^b   Cobb, J ^a   Hector, S D ^a  

^a SANDIA NATIONAL LABORATORIES   (United States)

^b MOTOROLA INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0040708648     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590936     Document Type: Article

References (17)

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