Ultrathin photoresists for EUV lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3676, Issue II, 1999, Pages 615-626

  Rao, Veena ^a   Cobb, Jonathan ^a   Henderson, Craig ^a   Okoroanyanwu, Uzodinma ^a   Bozman, Dan ^a   Mangat, Pawitter ^a   Brainard, Robert ^a   Mackevich, Joseph ^a  

^a INTEL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROMAGNETIC WAVE ATTENUATION; MASKS; ULTRATHIN FILMS; ULTRAVIOLET RADIATION;

EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL); ULTRATHIN PHOTORESISTS;

PHOTORESISTS;

EID: 0032687166     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.351135     Document Type: Conference Paper

References (2)