Compact Z-pinch EUV source for photolithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4343, Issue 1, 2001, Pages 615-620

  Schriever, G ^a   Rahe, M ^a   Stamm, U ^a   Basting, D ^a   Khristoforov, O ^b   Vinokhodov, A ^b   Borisov, V ^b  

^a Lambda Physik GmbH   (Germany)

^b TROITSK INSTITUTE FOR INNOVATION AND FUSION RESEARCH   (Russian Federation)

Author keywords

EUV source; Extreme ultraviolet; Gas discharge source; Z pinch

Indexed keywords

LIGHT SOURCES; PINCH EFFECT; PLASMA APPLICATIONS; SURFACE DISCHARGES; ULTRAVIOLET DEVICES; ULTRAVIOLET RADIATION;

EXTREME ULTRAVIOLET (EUV) LITHOGRAHY; GAS DISCHARGES;

PHOTOLITHOGRAPHY;

EID: 0034758516     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.436716     Document Type: Article

References (5)

1. Extreme ultraviolet light generation based on laser produced plasmas (LPP) and gas discharge based pinch plasmas: A comparison of different concepts
2. Extreme ultraviolet source development: A comparison of different concepts