Extreme Ultraviolet sources and measurement tools for EUV-lithography and system development

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5063, Issue , 2003, Pages 256-264

  Gabel K M ^a   Kleinschmidt, J ^a   Schriever, G ^a   Stamm, U ^a   Lebert, R ^b   Schurmann M C ^c  

^a XTREME Technologies GmbH   (Germany)

^b AIXUV GmbH   (Germany)

^c JENOPTIK Mikrotechnik GmbH   (Germany)

Author keywords

EUV lithography; EUV source; Gas discharge produced plasma; Laser produced plasma; XUV radiation; Z pinch

Indexed keywords

DEBRIS EMISSION; EUV-LITHOGRAPHY; GAS-DISCHARGE PRODUCED PLASMA; Z-PINCH;

LASER PRODUCED PLASMAS; MEASUREMENTS; MICROPROCESSOR CHIPS; PHOTOLITHOGRAPHY; PINCH EFFECT; PLASMA DIODES; SPACE DEBRIS; SPECTRUM ANALYSIS; X RAY ANALYSIS;

ULTRAVIOLET RADIATION;

EID: 2342597825     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.541147     Document Type: Conference Paper

References (6)

1. S. Owa, "EUV. source requirements", SEMATECH International EUV Source Workshop, 23 February 2003, Santa Clara, CA, USA
2. G. Schriever, M. Rahe, U. Stamm, D. Basting, O. Khristoforov, A. Vinokhodov, V. Borisov, "Compact Z-pinch EUV source for photolithography", Proc. SPIE 4343, 15-620 (2001)
3. U. Stamm, I. Ahmad, V. Borisov, K. Gäbel, S. Göze, A. Ivanov, O. Khristoforov, J. Kleinschmidt, V. Korobotchko, J. Ringling, G. Schriever, A. Vinokhodov, "High Power EUV sources for lithography", 3rd International Workshop on EUV Lithography, 2930 October 2001, Kunibiki Messe, Matsue-shi, Shimane, Japan
4. V. M. Borisov, U. Stamm, I. Ahmad, S. Goetze, A.S. Ivanov, O.B. Khristoforov, J. Kleinschmidt, V. Korobotchko, J. Ringling, G. Schriever, A.Y. Vinokhodov, "Development of high power EUV sources for lithography", Proc. SPIE 4688, 426-633 (2002).
5. U. Stamm, I. Ahmad, V. M. Borisov, F. Flohrer, K. Gabel, S. Göze, A. S. Ivanov, O. B. Khristoforov, D. Klöfel, P. Köler, J. Kleinschmidt, V. Korobotchko, J. Ringling, G. Schriever, A. Y. Vinokhodov, "High power EUV sources for lithography - A comparison of laser produced plasma and gas discharge produced plasma", Proc. SPIE 4688, 122-133 (2002).
6. U. Stamm, I. Ahmad, I. Balogh, H. Birner, D. Bolshukhin, J. Brudermann, S. Enke, F. Flohrer, K. Gäbel, S. Götze, G. Hergenhan, J. Kleinschmidt, D. Köpfel, V. Korobotchko, J. Ringling, G. Schriever, C. D. Tran, C. Ziener "High Power EUV Lithography Sources Based on Gas Discharges and Laser Produced Plasmas", Proc. SPIE 5037, paper 16 (2003)