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Journal of Crystal Growth

Volumn 290, Issue 1, 2006, Pages 73-79

Reflection high-energy electron diffraction study of molecular beam epitaxy growth of Pr2O3 on Si(0 0 1)

(4) Guo, Xiangxin a Braun, Wolfgang a Jenichen, Bernd a Ploog, Klaus H a

a PAUL DRUDE INSTITUT FÜR FESTKÖRPERELEKTRONIK (Germany)

Author keywords

A1. Reflection high energy electron diffraction; A3. Molecular beam epitaxy; B2. Dielectric materials

Indexed keywords

EPITAXIAL GROWTH; MOLECULAR BEAM EPITAXY; REFLECTION; SURFACE ROUGHNESS;

EPITAXIAL STABILIZATION; REFLECTION HIGH-ENERGY ELECTRON DIFFRACTION; STRUCTURAL FEATURES;

ELECTRON DIFFRACTION;

EID: 33645020840 PISSN: 00220248 EISSN: None Source Type: Journal
DOI: 10.1016/j.jcrysgro.2005.12.083 Document Type: Article

Times cited : (13)

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