Numerical analysis on particle coating by the pulsed plasma process

Chemical Engineering Science

Volumn 61, Issue 10, 2006, Pages 3278-3289

  Kim, Kyo Seon ^a   Kim, Dong Joo ^a   Zhao, Qian Qiu ^b  

^a Kangwon National University   (South Korea)

^b DUPONT COMPANY   (United States)

Author keywords

High quality thin film growth; Numerical analysis polymerization of negative ions; Particle coating; Pulsed plasmas; SiH4 plasma reactions

Indexed keywords

CONCENTRATION (PROCESS); DISSOCIATION; NUMERICAL ANALYSIS; POLYMERIZATION; SILICON; THIN FILMS;

HIGH-QUALITY THIN-FILM GROWTH; NUMERICAL ANALYSIS POLYMERIZATION OF NEGATIVE IONS; PARTICLE COATING; PULSED PLASMAS; SIH4 PLASMA REACTIONS;

COATING TECHNIQUES;

COATING TECHNIQUES; CONCENTRATION (PROCESS); DISSOCIATION; NUMERICAL ANALYSIS; POLYMERIZATION; SILICON; THIN FILMS;

EID: 33645014743     PISSN: 00092509     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ces.2005.12.003     Document Type: Article

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