Plasma parameter measurements and deposition of a-Si:H thin films in pulsed ECR plasma

Surface and Coatings Technology

Volumn 131, Issue 1-3, 2000, Pages 54-57

  Itagaki, N ^a   Fukuda, A ^a   Yoshizawa, T ^a   Shindo, M ^a   Ueda, Y ^a   Kawai, Y ^a  

^a KYUSHU UNIVERSITY   (Japan)

Author keywords

Amorphous silicon; ECR plasma; Plasma CVD; Pulsed plasma

Indexed keywords

PLASMA TREATMENT;

EID: 0034528285     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(00)00758-1     Document Type: Conference Paper

References (5)