Particle growth and transport in silane plasma chemical vapour deposition

Plasma Sources Science and Technology

Volumn 5, Issue 2, 1996, Pages 311-322

  Kim, Kyo Seon ^a   Ikegawa, Masato ^b  

^a Kangwon National University   (South Korea)

^b HITACHI LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AEROSOLS; CHEMICAL VAPOR DEPOSITION; COMPUTER SIMULATION; ELECTRIC FIELD EFFECTS; NUCLEATION; PARTICLES (PARTICULATE MATTER); PLASMA FLOW; PLASMA SHEATHS; PLASMA SIMULATION; PRESSURE EFFECTS; SILANES; TRANSPORT PROPERTIES;

PLASMA CHEMICAL VAPOR DEPOSITION (PCVD);

PLASMA APPLICATIONS;

EID: 0030134270     PISSN: 09630252     EISSN: None     Source Type: Journal    
DOI: 10.1088/0963-0252/5/2/029     Document Type: Article

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