Clustering phenomena in low-pressure reactive plasmas. Basis and applications

Pure and Applied Chemistry

Volumn 74, Issue 3, 2002, Pages 483-487

  Watanabe, Y ^a   Shiratani, M ^a   Koga, K ^a  

^a KYUSHU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

SILICON DERIVATIVE;

CHEMICAL REACTION KINETICS; CLUSTER ANALYSIS; CONFERENCE PAPER; FILM; GAS FLOW; HYPOBARISM; PHYSICAL CHEMISTRY; PLASMA CHEMISTRY; PRIORITY JOURNAL; PROBABILITY; REACTOR;

EID: 0036296864     PISSN: 00334545     EISSN: None     Source Type: Journal    
DOI: 10.1351/pac200274030483     Document Type: Conference Paper

References (9)