Partial-depth modulation study of anions and neutrals in low-pressure silane plasmas

Plasma Sources Science and Technology

Volumn 5, Issue 2, 1996, Pages 210-215

  Courteille, C ^a   Dorier, J L ^a   Hollenstein, Ch ^a   Sansonnens, L ^a   Howling, A A ^a  

^a EPFL   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

CARRIER CONCENTRATION; INTERFEROMETRY; IONS; MASS SPECTROMETRY; MODULATION; MOLECULAR DYNAMICS; SILANES;

CAPACITIVE DISCHARGES; PARTIAL DEPTH MODULATION; PLASMA MODULATION;

PLASMA SOURCES;

EID: 0030134021     PISSN: 09630252     EISSN: None     Source Type: Journal    
DOI: 10.1088/0963-0252/5/2/014     Document Type: Article

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