From molecules to particles in silane plasmas

Pure and Applied Chemistry

Volumn 68, Issue 5, 1996, Pages 1017-1022

  Howling, A A ^a   Courteille, C ^a   Doner, J L ^a   Sansonnens, L ^a   Hollenstein, Ch ^a  

^a EPFL   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 84967508860     PISSN: 00334545     EISSN: 13653075     Source Type: Journal    
DOI: 10.1351/pac199668051017     Document Type: Article

References (28)

1. G. S. Selwyn, Plasma Sources Sci. Technol. 3, 340 (1994).
2. M. J. Kushner, J. Appl. Phys. 63, 2532 (1988).
3. A. Garscadden, B.N. Ganguly, P. D. Haaland, and J. Williams, Plasma Sources Sci. Technol. 3, 239 (1994).
4. A. C. Breslin and K. G. Emeleus, Int. J. Electronics 31, 189 (1971).
5. J. Goree, Plasma Sources Sci. Technol. 3, 400 (1994).
6. S. J. Choi and M. J. Kushner, J. Appl. Phys. 74, 853 (1993).
7. Ch. Hollenstein, J.-L. Dorier, J. Dutta, L. Sansonnens, and A. A. Howling, Plasma Sources Sci. Technol. 3, 278 (1994).
8. L. Boufendi, J. Hermann, A. Bouchoule, B. Dubreuil, E. Stoffels, W. W. Stoffels, and M. L. de Giorgi, J. Appl. Phys. 76, 148 (1994).
9. A. A. Howling, L. Sansonnens, J.-L. Dorier, and Ch. Hollenstein, J. Appl. Phys. 75, 1340 (1994).
10. J. T. Verdeyen, J. Beberman, and L. Overzet, J. Vac. Sci. Technol. A 8, 1851 (1990).
11. P. Haaland, J. Chem. Phys. 93, 4066 (1990).
12. J. Perrin, Ch. Böhm, R. Etemadi and A. Lloret, Plasma Sources Sci. Technol. 3, 252 (1994).
13. L. J. Overzet, J. H. Beberman and J. T. Verdeyen, J. Appl. Phys. 66, 1622 (1989).
14. J.-L. Dorier, Ch. Hollenstein, and A. A. Howling, J. Vac. Sci. Technol. A. 13, 918 (1995).
15. A. A. Howling, J.-L. Dorier, and Ch. Hollenstein, Appl. Phys. Lett. 62, 1341 (1993).
16. C. Courteille, L. Sansonnens, J. Dutta, J.-L. Dorier, Ch. Hollenstein, A. A. Howling, and U. Kroll, Proc. 12th Eur. Photovoltaic Solar Energy Conf., Amsterdam, 1994, p. 319.
17. I. Haller, Appl. Phys. Lett. 37, 282 (1980).
18. M. L. Mandich, W. D. Reents, and K. D. Kolenbrander, Pure & Appl. Chem. 62, 1653 (1990).
19. T. P. Martin and H. Schaber, J. Chem. Phys. 83, 855 (1985).
20. A. W. Castleman, P. M. Holland, D. M. Lindsay, and K. I. Peterson, J. Am. Chem. Soc. 100, 6039 (1978).
21. J. Liu, G. L. Huppert, and H. H. Sawin, J. Appl. Phys. 68 3916 (1990).
22. M. Shiratani, T. Fukuzawa, K. Eto and Y. Watanabe, Jpn. J. Appl. Phys. 31, L1791 (1992).
23. J.-P. Boeuf, Phys. Rev. A 36, 2782 (1987).
24. L. A. Pinnaduwage, M. Z. Martin, and L. G. Christophorou, Appl. Phys. Lett. 65, 2571 (1994).
25. Y. Watanabe, M. Shiratani and H. Makino, Appl. Phys. Lett. 57, 1616 (1990).
26. S. Veprek, K. Schopper, O. Ambacher, W. Rieger and M. G. J. Veprek-Heijman, J. Electrochem. Soc. 140, 1935 (1993).
27. M. L. Mandich and W. D. Reents, J. Chem. Phys. 96, 4233 (1992).
28. L. Boufendi, A. Plain, J. Ph. Blondeau, A. Bouchoule, C. Laure, and M. Toogood, Appl. Phys. Lett. 60, 169 (1992).