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Journal of Applied Physics

Volumn 87, Issue 6, 2000, Pages 2691-2699

Modeling of rapid particle growth by coagulation in silane plasma reactor

(2) Kim, Kyo Seon a Kim, Dong Joo a

a Kangwon National University (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001031120 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.372243 Document Type: Article

Times cited : (26)

References (46)

1
- 0000470286
- S. J. Choi and M. J. Kushner, J. Appl. Phys. 74, 853 (1993).
- (1993) J. Appl. Phys. , vol.74 , pp. 853
- Choi, S.J.¹ Kushner, M.J.²

2
- 33747398068
- T. J. Sommerer, M. S. Barnes, J. H. Keller, M. J. McCaughey, and M. J. Kushner, Appl. Phys. Lett. 59, 638 (1991).
- (1991) Appl. Phys. Lett. , vol.59 , pp. 638
- Sommerer, T.J.¹ Barnes, M.S.² Keller, J.H.³ McCaughey, M.J.⁴ Kushner, M.J.⁵

3
- 0001141943
- M. J. McCaughey and M. J. Kushner, J. Appl. Phys. 69, 6952 (1991).
- (1991) J. Appl. Phys. , vol.69 , pp. 6952
- McCaughey, M.J.¹ Kushner, M.J.²

4
- 0000083153
- S. J. Choi, P. L. G. Ventzek, R. J. Hoekstra, and M. J. Kushner, Plasma Sources Sci. Technol. 3, 418 (1994).
- (1994) Plasma Sources Sci. Technol. , vol.3 , pp. 418
- Choi, S.J.¹ Ventzek, P.L.G.² Hoekstra, R.J.³ Kushner, M.J.⁴

5
- 0028415927
- S. J. Choi and M. J. Kushner, IEEE Trans. Plasma Sci. 22, 138 (1994).
- (1994) IEEE Trans. Plasma Sci. , vol.22 , pp. 138
- Choi, S.J.¹ Kushner, M.J.²

6
- 36449006049
- G. M. Jellum, J. E. Daugherty, and D. B. Graves, J. Appl. Phys. 69, 6923 (1991).
- (1991) J. Appl. Phys. , vol.69 , pp. 6923
- Jellum, G.M.¹ Daugherty, J.E.² Graves, D.B.³

7
- 0001666867
- M. D. Kilgore, L. E. Daugherty, R. K. Porteous, and D. B. Graves, J. Appl. Phys. 73, 7195 (1993).
- (1993) J. Appl. Phys. , vol.73 , pp. 7195
- Kilgore, M.D.¹ Daugherty, L.E.² Porteous, R.K.³ Graves, D.B.⁴

8
- 36449000011
- J. E. Daugherty and D. B. Graves, J. Appl. Phys. 78, 2279 (1995).
- (1995) J. Appl. Phys. , vol.78 , pp. 2279
- Daugherty, J.E.¹ Graves, D.B.²

9
- 84908774877
- G. S. Selwyn and E. F. Patterson, J. Vac. Sci. Technol. A 10, 1053 (1992).
- (1992) J. Vac. Sci. Technol. A , vol.10 , pp. 1053
- Selwyn, G.S.¹ Patterson, E.F.²

10
- 0347854725
- G. S. Selwyn, Semicond. Int. 72, (1993).
- (1993) Semicond. Int. , vol.72
- Selwyn, G.S.¹

11
- 0027607956
- A. A. Howling, L. Sansonnens, J.-L. Dorier, and Ch. Hollenstein, J. Phys. D: Appl. Phys. 26, 1003 (1993).
- (1993) J. Phys. D: Appl. Phys. , vol.26 , pp. 1003
- Howling, A.A.¹ Sansonnens, L.² Dorier, J.-L.³ Hollenstein, Ch.⁴

12
- 0002817277
- A. A. Howling, J.-L. Dorier, and Ch. Hollenstein, Appl. Phys. Lett. 62, 1341 (1993).
- (1993) Appl. Phys. Lett. , vol.62 , pp. 1341
- Howling, A.A.¹ Dorier, J.-L.² Hollenstein, Ch.³

13
- 0001314405
- C. Courteille, Ch. Hollenstein, J.-L. Dorier, P. Gay, W. Schwarrenbach, A. A. Howling, E. Bertran, G. Viera, R Martins, and A. Macarico, J. Appl. Phys. 80, 2069 (1996).
- (1996) J. Appl. Phys. , vol.80 , pp. 2069
- Courteille, C.¹ Hollenstein, Ch.² Dorier, J.-L.³ Gay, P.⁴ Schwarrenbach, W.⁵ Howling, A.A.⁶ Bertran, E.⁷ Viera, G.⁸ Martins, R.⁹ Macarico, A.¹⁰

14
- 0028419715
- M. Shiratani, T. Fukuzawa, and Y. Watanabe, IEEE Trans. Plasma Sci. 22, 103 (1994).
- (1994) IEEE Trans. Plasma Sci. , vol.22 , pp. 103
- Shiratani, M.¹ Fukuzawa, T.² Watanabe, Y.³

15
- 0006663063
- Y. Watanabe and M. Shiratani, Plasma Sources Sci. Technol. 3, 286 (1994).
- (1994) Plasma Sources Sci. Technol. , vol.3 , pp. 286
- Watanabe, Y.¹ Shiratani, M.²

16
- 0029770344
- M. Shiratani, H. Kawasaki, T. Fukuzawa, T. Yoshioka, Y. Ueda, S. Singh, and Y. Watanabe, J. Appl. Phys. 79, 104 (1996).
- (1996) J. Appl. Phys. , vol.79 , pp. 104
- Shiratani, M.¹ Kawasaki, H.² Fukuzawa, T.³ Yoshioka, T.⁴ Ueda, Y.⁵ Singh, S.⁶ Watanabe, Y.⁷

17
- 0030525442
- Y. Watanabe, M. Shiratani, H. Kawasaki, S. Singh, T. Fukuzawa, Y. Ueda, and H. Ohkura, J. Vac. Sci. Technol. A 14, 540 (1996).
- (1996) J. Vac. Sci. Technol. A , vol.14 , pp. 540
- Watanabe, Y.¹ Shiratani, M.² Kawasaki, H.³ Singh, S.⁴ Fukuzawa, T.⁵ Ueda, Y.⁶ Ohkura, H.⁷

18
- 0031146489
- Y. Watanabe, Plasma Phys. Controlled Fusion 39, A59 (1997).
- (1997) Plasma Phys. Controlled Fusion , vol.39
- Watanabe, Y.¹

19
- 0031176680
- H. Kawasaki, H. Ohkura, T. Fukuzawa, M. Shiratani, Y. Watanabe, Y. Yamamoto, S. Suganuma, M. Hori, and T. Goto, Jpn. J. Appl. Phys., Part 1 36, 4985 (1997).
- (1997) Jpn. J. Appl. Phys., Part 1 , vol.36 , pp. 4985
- Kawasaki, H.¹ Ohkura, H.² Fukuzawa, T.³ Shiratani, M.⁴ Watanabe, Y.⁵ Yamamoto, Y.⁶ Suganuma, S.⁷ Hori, M.⁸ Goto, T.⁹

20
- 0032179678
- H. Kawasaki, K. Sakamoto, S. Maeda, T. Fukuzawa, M. Shiratani, and Y. Watanabe, Jpn. J. Appl. Phys., Part 2 37, 1264 (1998).
- (1998) Jpn. J. Appl. Phys., Part 2 , vol.37 , pp. 1264
- Kawasaki, H.¹ Sakamoto, K.² Maeda, S.³ Fukuzawa, T.⁴ Shiratani, M.⁵ Watanabe, Y.⁶

21
- 36149031098
- L. Boufendi and A. Bouchoule, Plasma Sources Sci. Technol. 3, 262 (1994).
- (1994) Plasma Sources Sci. Technol. , vol.3 , pp. 262
- Boufendi, L.¹ Bouchoule, A.²

22
- 21544469810
- L. Boufendi, A. Plain, J. Ph. Blondeau, A. Bouchoule, C. Laure, and M. Toogood, Appl. Phys. Lett. 60, 169 (1992).
- (1992) Appl. Phys. Lett. , vol.60 , pp. 169
- Boufendi, L.¹ Plain, A.² Blondeau, J.Ph.³ Bouchoule, A.⁴ Laure, C.⁵ Toogood, M.⁶

23
- 0001402789
- A. Bouchoule, L. Boufendi, J. Hermann, A. Plain, T. Hbid, G. Kroesen, E. and W. W. Stoffels, Pure Appl. Chem. 68, 1121 (1996).
- (1996) Pure Appl. Chem. , vol.68 , pp. 1121
- Bouchoule, A.¹ Boufendi, L.² Hermann, J.³ Plain, A.⁴ Hbid, T.⁵ Kroesen, G.E.⁶ Stoffels, W.W.⁷

24
- 0344319524
- A. Bouchoule, A. Plain, L. Boufendi, J. Ph. Blondeau, and C. Laure, J. Appl. Phys. 70, 1991 (1991).
- (1991) J. Appl. Phys. , vol.70 , pp. 1991
- Bouchoule, A.¹ Plain, A.² Boufendi, L.³ Blondeau, J.Ph.⁴ Laure, C.⁵

25
- 36149034135
- A. Garscadden, B. N. Ganguly, P. D. Haaland, and J. Williams, Plasma Sources Sci. Technol. 3, 239 (1994).
- (1994) Plasma Sources Sci. Technol. , vol.3 , pp. 239
- Garscadden, A.¹ Ganguly, B.N.² Haaland, P.D.³ Williams, J.⁴

26
- 0001571391
- M. Horanyi and C. K. Goertz, Astrophys. J. 361, 155 (1990).
- (1990) Astrophys. J. , vol.361 , pp. 155
- Horanyi, M.¹ Goertz, C.K.²

27
- 0028461506
- M. Sato, M. Shiratani, and Y. Watanabe, Jpn. J. Appl. Phys., Part 1 33, 4266 (1994).
- (1994) Jpn. J. Appl. Phys., Part 1 , vol.33 , pp. 4266
- Sato, M.¹ Shiratani, M.² Watanabe, Y.³

28
- 0347854724
- A. A. Fridman, L. Boufendi, T. Hbid, B. V. Potapkin, and A. Bouchoule, J. Appl. Phys. 79, (1996).
- (1996) J. Appl. Phys. , vol.79
- Fridman, A.A.¹ Boufendi, L.² Hbid, T.³ Potapkin, B.V.⁴ Bouchoule, A.⁵

29
- 0001076462
- D. S. Lemons, R. K. Keinigs, D. Winske, and M. E. Jones, Appl. Phys. Lett. 68, 613 (1996).
- (1996) Appl. Phys. Lett. , vol.68 , pp. 613
- Lemons, D.S.¹ Keinigs, R.K.² Winske, D.³ Jones, M.E.⁴

30
- 0031559551
- S. L. Girshick, J. Chem. Phys. 107, 1948 (1997).
- (1997) J. Chem. Phys. , vol.107 , pp. 1948
- Girshick, S.L.¹

31
- 0030134270
- K. S. Kim and M. Ikeguwa, Plasma Sources Sci. Technol. 5, 311 (1996).
- (1996) Plasma Sources Sci. Technol. , vol.5 , pp. 311
- Kim, K.S.¹ Ikeguwa, M.²

32
- 0031176729
- D. J. Kim and K. S. Kim, Jpn. J. Appl. Phys., Part 1 36, 4989 (1997).
- (1997) Jpn. J. Appl. Phys., Part 1 , vol.36 , pp. 4989
- Kim, D.J.¹ Kim, K.S.²

33
- 0346594636
- in press
- D. J. Kim and K. S. Kim, Aerosol. Sci. Technol., in press (2000).
- (2000) Aerosol. Sci. Technol.
- Kim, D.J.¹ Kim, K.S.²

34
- 0000846519
- U. Kortshagen and U. Bhandarkar, Phys. Rev. E 60, 887 (1999).
- (1999) Phys. Rev. E , vol.60 , pp. 887
- Kortshagen, U.¹ Bhandarkar, U.²

35
- 0000755968
- J. Goree, Plasma Sources Sci. Technol. 3, 400 (1994).
- (1994) Plasma Sources Sci. Technol. , vol.3 , pp. 400
- Goree, J.¹

36
- 0028417054
- B. Walch, M. Horanyi, and S. Robertson, IEEE Trans. Plasma Sci. 22, 97 (1994).
- (1994) IEEE Trans. Plasma Sci. , vol.22 , pp. 97
- Walch, B.¹ Horanyi, M.² Robertson, S.³

37
- 0000676447
- B. Walch, M. Horanyi, and S. Robertson, Phys. Rev. Lett. 75, 838 (1995).
- (1995) Phys. Rev. Lett. , vol.75 , pp. 838
- Walch, B.¹ Horanyi, M.² Robertson, S.³

38
- 36449008097
- T. Matsoukas and M. Russell, J. Appl. Phys. 77, 4285 (1995).
- (1995) J. Appl. Phys. , vol.77 , pp. 4285
- Matsoukas, T.¹ Russell, M.²

39
- 0030530382
- T. Matsoukas, M. Russell, and M. Smith, J. Vac. Sci. Technol. A 14, 624 (1996).
- (1996) J. Vac. Sci. Technol. A , vol.14 , pp. 624
- Matsoukas, T.¹ Russell, M.² Smith, M.³

40
- 0030732227
- T. Matsoukas, J. Colloid Interface Sci. 187, 474 (1997).
- (1997) J. Colloid Interface Sci. , vol.187 , pp. 474
- Matsoukas, T.¹

41
- 0000732420
- B. F. Gordiets and C. M. Ferreira, J. Appl. Phys. 84, 1231 (1998).
- (1998) J. Appl. Phys. , vol.84 , pp. 1231
- Gordiets, B.F.¹ Ferreira, C.M.²

42
- 0000818819
- B. F. Gordiets and C. M. Ferreira, J. Appl. Phys. 86, 4118 (1999).
- (1999) J. Appl. Phys. , vol.86 , pp. 4118
- Gordiets, B.F.¹ Ferreira, C.M.²

43
- 0001250792
- S. A. Khrapak, A. P. Nefedov, O. F. Petrov, and O. S. Vaulina, Phys. Rev. E 59, 6017 (1999).
- (1999) Phys. Rev. E , vol.59 , pp. 6017
- Khrapak, S.A.¹ Nefedov, A.P.² Petrov, O.F.³ Vaulina, O.S.⁴

44
- 0003609145
- Wiley Interscience, New York
- S. K. Friedlander, Smoke, Dust, and Haze (Wiley Interscience, New York, 1977).
- (1977) Smoke, Dust, and Haze
- Friedlander, S.K.¹

45
- 0003730831
- Wiley Interscience, New York
- M. A. Lieberman and A. J. Lichtenberg, Principles of Plasma Discharges and Materials Processing (Wiley Interscience, New York, 1994).
- (1994) Principles of Plasma Discharges and Materials Processing
- Lieberman, M.A.¹ Lichtenberg, A.J.²

46
- 0003543788
- Texas Tech University Press, Texas
- J. B. Riggs, An Introduction to Numerical Methods for Chemical Engineers (Texas Tech University Press, Texas, 1988).
- (1988) An Introduction to Numerical Methods for Chemical Engineers
- Riggs, J.B.¹

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