In situ spectroscopic ellipsometry in plasma-assisted molecular beam epitaxy of InN under different surface stoichiometries

Journal of Applied Physics

Volumn 99, Issue 4, 2006, Pages

  Yoshitani, Masayoshi ^a   Akasaka, Koichiro ^a   Wang, Xinqiang ^a   Che, Song Bek ^a   Ishitani, Yoshihiro ^a   Yoshikawa, Akihiko ^a  

^a CHIBA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELLIPSOMETRY; PLASMA APPLICATIONS; SAPPHIRE; STOICHIOMETRY; SUBSTRATES;

DIELECTRIC FUNCTIONS; INDIUM-BEAM FLUX; SURFACE STOICHIOMETRY;

INDIUM COMPOUNDS;

EID: 33644593288     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2172703     Document Type: Article

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