Spectroscopic ellipsometry during metalorganic vapor phase epitaxy of InN

Journal of Crystal Growth

Volumn 248, Issue SUPPL., 2003, Pages 523-527

  Schmidtling, T ^a   Drago, M ^a   Pohl, U W ^a   Richter, W ^a  

^a TECHNISCHE UNIVERSITÄT BERLIN   (Germany)

Author keywords

A1. In situ spectroscopic ellipsometry; A3. Metalorganic vapor phase epitaxy; B1. Indium nitride; B1. Nitrides; B2. Semiconducting III V materials

Indexed keywords

CRYSTALLINE MATERIALS; ELLIPSOMETRY; METALLORGANIC VAPOR PHASE EPITAXY; MORPHOLOGY; SUBSTRATES;

INDIUM NITRIDE;

SEMICONDUCTING INDIUM COMPOUNDS;

EID: 0037292369     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0248(02)01814-6     Document Type: Conference Paper

References (14)

1. D'Ans Lax, in: E. Lax, C. Synowietz, (Eds.), Taschenbuch für Chemiker und Physiker, Band I, Springer, Berlin, 1967.
2. Chen W.-K., Pan Y.-C., -C Lin H., Ou J., Chen W.-H., Lee M.-C. Jpn. J. Appl. Phys. 36:1997;L1625.
3. Peters S., Schmidtling T., Trepk T., Pohl U.W., Zettler J.-T., Richter W. J. Appl. Phys. 88:2000;4085.
4. Ikuta K., Inoue Y., Takai O. Thin Solid Films. 334:1998;49
5. Osamura K., Nakajima K., Murakami Y. Solid State Commun. 11:1972;617.
6. Davidov V.Yu., Klochkin A.A., Seisyan R.P.et al. Phys. Stat. Sol. B. 229:2002;R1.
7. M. Cardona, in: M. Cardona, G. Günterodt (Eds.), Light scattering in Solids V, Top. Appl. Phys. Vol. 50, Springer, Berlin, Heidelberg, 1982, p. 19.
8. Azzam R.M.A., Bashara N.M. Ellipsometry and Polarized Light. 1977;North Holland Personal Library, Amsterdam.
9. Rossow U., Richter W. Bauer G., Richter W. Optical Characterization of Epitaxial Semiconductor Layers. 1996;111 Springer, Berlin, Heidelberg.
10. Wethkamp T., Wilmers K., Cobet C.et al. Phys. Rev. B. 59:1999;1845.
11. Bhuyan G., Yamamoto A., Hashimoto A. Phys. Stat. Sol. B. 228:2001;27.
12. Kaczmarczyk G., Kaschner A., Reich S., Hoffmann A., Thomsen C., As D.J., Lima A.P., Schikora D., Lischka K., Averbeck R., Riechert H. Appl. Phys. Lett. 76:2000;2122.
13. Kwon H.-J., Lee Y.-H., Miki O., Yamano H., Yoshida A. Appl. Phys. Lett. 69:1996;937.
14. Lee M.-C., Lin H.-C., Pan Y.-C., Chu C.-K., Ou J., Chen W.-H., Chen W.-K. Appl. Phys. Lett. 73:1998;2606.