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Journal of Photopolymer Science and Technology

Volumn 17, Issue 3, 2004, Pages 465-474

Ultra-thin resists for advanced lithography

(3) Peters, Richard a Cobb, Jonathan a Parker, Colita a

a MOTOROLA INC (United States)

Author keywords

Contacts; Defects; Gate patterning; Hardmask; LER; Ultra thin resist

Indexed keywords

ABSORPTION; ARTICLE; DEVICE; LITHOGRAPHY; MATERIAL COATING; SEMICONDUCTOR; SPECTRAL SENSITIVITY; TECHNIQUE; TECHNOLOGY; ULTRATHIN RESIST; ULTRAVIOLET RADIATION;

EID: 3142631822 PISSN: 09149244 EISSN: None Source Type: Journal
DOI: 10.2494/photopolymer.17.465 Document Type: Article

Times cited : (3)

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