Manufacturability of the ultra-thin resist process

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3997, Issue , 2000, Pages 328-333

  Pike, Christopher ^a   Bell, Scott ^a   Plat, Marina ^a   King, Paul ^a   Nguyen, Khanh ^a   Lyons, Chris ^a   Levinson, Harry ^a   Phan, Khoi ^a   Okoroanyanwu, Uzodinma ^a  

^a ADVANCED MICRO DEVICES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

GATES (TRANSISTOR); MASKS; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR DEVICE MANUFACTURE; SILICON WAFERS; ULTRATHIN FILMS; ULTRAVIOLET RADIATION;

ULTRATHIN RESISTS;

PHOTORESISTS;

EID: 0033699248     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (7)