Polymer dynamics and diffusive properties in ultra-thin photoresist films

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5039 I, Issue , 2003, Pages 366-375

  Soles, Christopher L ^a   Jones, Ronald L ^a   Lenhart, Joseph L ^a   Prabhu, Vivek M ^a   Wu, Wen Li ^a   Lin, Eric K ^a   Goldfarb, Dario L ^b   Angelopoulos, Marie ^b  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

Confinement; Diffusion; Moisture transport; Neutron scattering; Photoacid mobility; Thin films

Indexed keywords

CHEMICAL RELAXATION; DIFFUSION; MOISTURE; MOLECULAR DYNAMICS; NEUTRON SCATTERING; POLYSTYRENES; REACTION KINETICS; THICKNESS MEASUREMENT; ULTRATHIN FILMS;

BILAYER DIFFUSION COUPLE MEASUREMENTS; CONFINEMENT EFFECTS; PHOTOCHEMICALLY ACTIVATED ACIDIC PROTONS; PHOTORESIST FILMS; POLYMER DYNAMICS; POLYTERTBUTOSYCARBOXYSTYRENE;

PHOTORESISTS;

EID: 0141831734     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.485140     Document Type: Conference Paper

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