X-ray absorption spectroscopy to probe interfacial issues in photolithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5039 I, Issue , 2003, Pages 343-356

  Lenhart, Joseph L ^a   Fischer, Daniel A ^b   Sambasivan, Sharadha ^b   Lin, Eric K ^b   Jones, Ronald L ^b   Soles, Christopher L ^b   Wu, Wen Li ^b   Goldfarb, Dario L ^c   Angelopoulos, Marie ^c  

^a SANDIA NATIONAL LABORATORIES   (United States)

^b NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^c IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION SPECTROSCOPY; COMPOSITION; INTERFACES (MATERIALS); MATHEMATICAL MODELS; SURFACE PHENOMENA; SURFACE ROUGHNESS; X RAY SPECTROSCOPY;

CHEMICALLY AMPLIFIED PHOTORESISTS; EDGE ROUGHNESS; PHOTOACID GENERATOR; SURFACE SEGREGATION; X RAY ABSORPTION FINE STRUCTURE SPECTROSCOPY; X RAY ABSORPTION SPECTROSCOPY;

PHOTORESISTS;

EID: 0141834770     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.485149     Document Type: Conference Paper

References (28)

1. 2001 National Technology Roadmap for Semiconductors, The Semiconductor Industry Association: San Jose, CA, (2001).
2. K. E. Uhrich, E. Reichmanis, F.A. Baiocchi, Chem. Mater. 6, 295 (1994).
3. T. H. Fedynyshyn, J. W. Thackeray, J. H. Georger, M. D. Denison, J. Vac. Sci. Technol. B. 12(6), 3888 (1994).
4. P.M. Detinger, J. Vac. Sci. Technol. 18(6), 3364 (2000).
5. D.S. Fryer, Nealey P. F., J. J. de Pablo, J. Vac. Sci. Technol. 18(6), 3376 (2000).
6. Q. Lin, R. Sooriyakumaran, W-S. Huang, Proc. SPIE, 3999, 230-239 (2000).
7. G. M. Wallraff, W. D. Hinsberg, Chem. Rev. 99, 1801 (1999).
8. O. Nalamasu, A. G. Timko, E. Reichmanis, F. M. Houlihan, A. E. Novembre, R. Tarascon, N. Munzel, S. G. Slater, ACS Symposium Series, 614, 4 (1995).
9. T. Kozawa, M. Uesaka, Y. Yoshida, S. Tagawa, Jpn. J. Appl. Phys. 32, 6049 (1993).
10. O. Nalamasu, E. Reichmanis, J. E. Hanson, R. S. Kanga, L. A. Heimbrook, A. B. Emerson, F. A. Baiocchi, S. Vaidya, Polym. Eng. Sci. 32, 1565 (1992).
11. S. A. MacDonald, W. D. Hinsberg, R. Wendt, N. J. Dlecak, G. C. Wilson, C. D. Snyder, Chem. Mater. 5, 348 (1993).
12. W. D. Hinsberg, S. A. MacDonald, N. J. Dlecak, C. D. Snyder, Chem. Mater. 6, 481 (1994).
13. H. Ito, Jpn. J. Appl. Phys. 31, 4273 (1992).
14. T. Itani, H. Yoshino, M. Fujimoto, K. Kasama, J. Vac. Sci. Technol. B 13, 3026 (1995).
15. G. W. Reynolds, J. W. Taylor, J. Vac. Sci. Technol. B, 17, 334 (1999).
16. G. P. Patsis, N. Glezos, I. Raptis, E. S. Valamontes, J. Vac. Sci. Technol. B, 17, 3369 (1999).
17. G. M. Schmid, M. D. Smith, C. A. Mack, V. K. Singh, S. D. Burns, C. G. Willson, Proc. SPIE, 3999, 675 (2000).
18. Y.-S. Kim, Y.-H. Kim, S. H. Lee, Y.-G. Yim, J.-H. Kim, Proc. SPIE, 4690, 829 (2002).
19. M. Yoshizawa, S. Moriya, J. Vac. Sci. Technol. B, 20, 1342 (2002).
20. Q. Lin, R. Sooriyakumaran, W.-S. Huang, Proc. SPIE, 3999, 230 (2000).
21. L. W. Flanagin, V. K. Singh, C. G. Wilson, J. Vac. Sci. Technol. B, 17, 1371 (1999).
22. Certain commercial equipment, instruments, or materials are identified in this paper in order to specify the experimental procedure adequately. Such identification is not intended to imply recommendation or endorsement by the National Institute of Standards and Technology, nor is it intended to imply that the materials or equipment are necessarily the best available for the purpose.
23. For detailed information about the NIST/Dow Soft X-ray Materials Characterization Facility at NSLS BNL, see: http:nslweb.nsls.bnl.gov/nsls/pubs/newsletters/pdfs/96-nov.pdf
24. D. A. Fischer, J. Colbert, J. L. Gland, Rev. Sci. Instrum. 60(7), 1596 (1989).
25. J. Stöhr, NEXAFS Spectroscopy, Springer Series in Surface Science (Springer, Heidelberg, 1992), Vol. 25.
26. H. Yoshino, T. Itani, S. Hashimoto, M. Yamana, N. Samoto, K. Kasama, A. G. Timko, O. Nalamasu, Microelect. Eng. 35, 153 (1997).
27. D. L. Goldfarb, M. Angelopoulos, E. K. Lin, R. L. Jones, C. L. Soles, J. L. Lenhart, W. L. Wu, J. Vac. Sci. Technol. B, 19, 2699 (2001).
28. E. K. Lin, C. L. Soles, D. L. Goldfarb, B. C. Trinque, S. D. Burns, R. L. Jones, J. L. Lenhart, M. Angeloupolos, C. G. Wilson, S. K. Satija, W. L. Wu, Science, 297, 372 (2002).