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Volumn 4346, Issue 2, 2001, Pages 970-981

When is bilayer thin-film imaging suitable: Comparison with single layer resists

Author keywords

Bilayer resist; Dense contact; Dual damascene; Etch selectivity; Thin film imaging; Trench planarization

Indexed keywords

ASPECT RATIO; DIELECTRIC MATERIALS; ETCHING; IMAGING TECHNIQUES; LITHOGRAPHY; MASKS;

EID: 0000726246     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.435797     Document Type: Article
Times cited : (6)

References (11)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.