Lithography using ultrathin resist films

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 18, Issue 6, 2000, Pages 3360-3363

  Pike, Christopher ^a   Bell, Scott ^a   Lyons, Chris ^a   Plat, Marina ^a   Levinson, Harry ^a   Okoroanyanwu, Uzodinma ^a  

^a ADVANCED MICRO DEVICES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEFECTS; MASKS; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING FILMS; SILICON WAFERS; ULTRATHIN FILMS;

ULTRATHIN RESIST FILMS;

LITHOGRAPHY;

EID: 0034316081     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1324640     Document Type: Article

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