Novel silicon-containing resists for EUV and 193 nm lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3678, Issue I, 1999, Pages 214-220

  Kessel, Carl R ^a   Boardman, Larry D ^a   Rhyner, Steven J ^a   Cobb, Jonathan L ^a   Henderson, Craig C ^a   Rao, Veena ^a   Okoroanyanwu, Uzodinma ^a  

^a 3M COMPANY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COPOLYMERS; OPTICAL RESOLVING POWER; PHOTOSENSITIVITY; SILICON;

CHEMICAL AMPLIFICATION;

PHOTORESISTS;

EID: 0032671542     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.350204     Document Type: Conference Paper

References (10)