Integration of ultrathin resist processes into MPU IC manufacturing flows

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4345, Issue I, 2001, Pages 261-272

  Cobb, J ^a   Conley, W ^a   Guenther, T ^a   Huang, F ^a   Lee, J J ^a   Lii, T ^a   Dakshina Murthy, S ^a   Parker, C ^a   Usmani, S ^a   Wu, W ^a   Hector, S ^a  

^a MOTOROLA INC   (United States)

Author keywords

157nm lithography; EUV lithography; Hardmasks; Low k1 imaging; Ultrathin resist; UTR

Indexed keywords

DEFECTS; ETCHING; GATES (TRANSISTOR); IMAGE ANALYSIS; MASKS; POLYSILICON; SPIN COATING; ULTRATHIN FILMS; ULTRAVIOLET RADIATION;

ULTRATHIN RESISTS;

PHOTORESISTS;

EID: 0000678610     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.436856     Document Type: Conference Paper

References (7)