Ultrafast patterning of nanostructures in polymers using laser assisted nanoimprint lithography

Applied Physics Letters

Volumn 83, Issue 21, 2003, Pages 4417-4419

  Xia, Qiangfei ^a   Keimel, Chris ^a   Ge, Haixiong ^a   Yu, Zhaoning ^a   Wu, Wei ^a   Chou, Stephen Y ^a  

^a Princeton University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; EXCIMER LASERS; LASER PULSES; LITHOGRAPHY; NANOSTRUCTURED MATERIALS; POLYMERS; QUARTZ; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR DEVICE MANUFACTURE; ULTRAFAST PHENOMENA;

LASER ASSISTED NANOIMPRINT LITHOGRAPHY; PITCH GRATINGS; ULTRAFAST PATTERNING;

SEMICONDUCTOR DEVICE STRUCTURES;

EID: 0346215986     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1630162     Document Type: Article

References (11)

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