Study of PMMA recoveries on micrometric patterns replicated by nano-imprint lithography

Physica E: Low-Dimensional Systems and Nanostructures

Volumn 17, Issue 1-4, 2003, Pages 523-525

  Martin, Christel ^a   Ressier, Laurence ^a   Peyrade, Jean Pierre ^a  

^a CNRS   (France)

Author keywords

Atomic force microscopy; Nanoimprint lithography; PMMA

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELASTIC MODULI; POLYMETHYL METHACRYLATES; TENSILE STRENGTH;

NANOIMPRINT LITHOGRAPHY;

PHOTOLITHOGRAPHY;

EID: 0037395176     PISSN: 13869477     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1386-9477(02)00859-7     Document Type: Conference Paper

References (5)

1. Chou S.Y.et al. Appl. Phys. Lett. 67:1995;3114.
2. Chou S.Y.et al. J. Vac. Sci. Technol. B. 15:1997;2897.
3. Li Mingtaoet al. Appl. Phys. Lett. 76:2000;673.
4. Pépin A.et al. Microelectron. Eng. 61-62:2002;927.
5. Lebib A.et al. Microelectron. Eng. 57-58:2001;405.