Study of nitrogen pressure effect on the laser-deposited amorphous carbon films

Thin Solid Films

Volumn 292, Issue 1-2, 1997, Pages 318-323

  Bulir J ^a   Jelinek M ^a   Vorlicek V ^a   Zemek, J ^a   Perina V ^b  

^a INSTITUTE OF PHYSICS   (Czech Republic)

^b NUCLEAR PHYSICS INSTITUTE   (Czech Republic)

Author keywords

Carbon; Laser ablation; Nitrogen; Stress

Indexed keywords

AMORPHOUS FILMS; CALCULATIONS; DEPOSITION; ELECTRIC CONDUCTIVITY; ENERGY GAP; LIGHT TRANSMISSION; NITROGEN; PRESSURE EFFECTS; PULSED LASER APPLICATIONS; SPECTROSCOPY; STRESSES; VACUUM;

CARBON NITRIDE FORMATION; MOLECULAR NITROGEN PRESSURE; OPTICAL BANDGAP; PULSED LASER DEPOSITION;

CARBON;

EID: 0031553490     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(96)08951-1     Document Type: Article

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