Formation of hydrogenated amorphous carbon films by plasma based ion implantation system applying RF and negative high voltage pulses through single feedthrough

Surface and Coatings Technology

Volumn 156, Issue 1-3, 2002, Pages 328-331

  Mokuno, Y ^a   Chayahara, A ^a   Horino, Y ^a   Nishimura, Y ^b  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b Kurita Seisakusho Co Ltd   (Japan)

Author keywords

DLC; Hydrogenated amorphous carbon; Plasma based ion implantation

Indexed keywords

CARBON; CONTINUOUS WAVE LASERS; ELASTIC MODULI; HARDNESS; HYDROGENATION; INDENTATION; ION IMPLANTATION; METHANE;

PLASMA BASED ION IMPLANTATION SYSTEMS;

AMORPHOUS FILMS;

CARBON; FILM; FRICTION; HARDNESS; MECHANICAL PROPERTY; PLASMA TREATMENT;

EID: 0036641622     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(02)00103-2     Document Type: Article

References (5)