Effects of deposition pressure on structure and hardness of amorphous carbon nitride films synthesized by shielded arc ion plating

Thin Solid Films

Volumn 334, Issue 1-2, 1998, Pages 165-172

  Taki, Yusuke ^a,b   Tajima, Nobuhiro ^a   Takai, Osamu ^a  

^a NAGOYA UNIVERSITY   (Japan)

^b NIKON CORPORATION   (Japan)

Author keywords

Carbon; Hardness; Ion plating; Nitride

Indexed keywords

CARBON INORGANIC COMPOUNDS; FILM PREPARATION; ION BOMBARDMENT; PRESSURE EFFECTS; SYNTHESIS (CHEMICAL);

SHIELDED ARC ION PLATING (SAIP);

AMORPHOUS FILMS;

EID: 0032483868     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)01137-7     Document Type: Article

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