Properties of CNx films prepared by PECVD

Diamond and Related Materials

Volumn 8, Issue 8-9, 1999, Pages 1730-1731

  Cerny F ^a   Gurovie J ^a   Huttel I ^b   Suchanek J ^c   Djouadi, A ^d   Hnatowicz, V ^e  

^a CZECH TECHNICAL UNIVERSITY IN PRAGUE   (Czech Republic)

^b INSTITUTE OF CHEMICAL TECHNOLOGY   (Czech Republic)

^c SVUM as   (Czech Republic)

^d ARTS ET MÉTIERS PARISTECH   (France)

^e NUCLEAR PHYSICS INSTITUTE   (Czech Republic)

Author keywords

Carbon nitride; Friction coefficient; Internal stress; Plasma enhanced CVD

Indexed keywords

FRICTION; NITRIDES; OPTICAL PROPERTIES; ORGANIC SOLVENTS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RESIDUAL STRESSES; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SILICON; STEEL; SURFACE TREATMENT; THICKNESS MEASUREMENT; ULTRASONIC APPLICATIONS;

CARBON NITRIDE; ELECTRON PROBE MICROANALYSIS; FRICTION COEFFICIENT; STRESS MEASUREMENT;

DIAMOND FILMS;

EID: 0032594130     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0925-9635(99)00030-8     Document Type: Article

References (6)

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3. I. Gousman, Thin Solid Films 253 (1994) 90.
4. S. Konvičková, D. Valerián, Acta Mech. Slov. 2 (1998) 39.
5. S. Goel, J.C. Pincenti, D.I. Naylor, Appl. Optics 32 (1993) 318.
6. M.A. Djouadi, J. Quesada, J. Pitter, J. Cizner, F. Černý, in: Proc. Fourth European Conference on Residual Stresses (Cluny, France, 4-6 June 1996), Société Française de Métallurgie et de Matériaux (SF2M), Paris, France, 1996, p. 795.