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Volumn 5756, Issue , 2005, Pages 240-254

Assessing the impact of real world manufacturing lithography variations on post-OPC CD control

Author keywords

Aberrations; DFM; DOF; Flare; Misalignment; Model Based OPC; ORC; Process Window

Indexed keywords

DFM; DOF; FLARE; MISALIGNMENT; MODEL BASED OPC; ORC; PROCESS WINDOW;

EID: 25144501489     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.598063     Document Type: Conference Paper
Times cited : (11)

References (20)
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.