Impact of measured pupil illumination fill distribution on lithography simulation and OPC models

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5377, Issue PART 2, 2004, Pages 1130-1145

  Bodendorf, Christof ^a   Schlief, Ralph E ^b   Ziebold, Ralf ^a  

^a INFINEON TECHNOLOGIES AG   (Germany)

^b Infineon Technologies NA   (United States)

Author keywords

Low k1 lithography; Measured light source distribution; Optical lithography simulation; Optical proximity correction; Pupil fill measurement

Indexed keywords

ABERRATIONS; COHERENT LIGHT; COMPUTER SIMULATION; IMAGE PROCESSING; INTERPOLATION; MATHEMATICAL MODELS; OPTIMIZATION;

MEASURED LIGHT SOURCE DISTRIBUTIONS; OPTICAL LITHOGRAPHY SIMULATION; OPTICAL PROXIMITY CORRECTIONS; PUPIL FILL MEASUREMENTS;

PHOTOLITHOGRAPHY;

EID: 3843143812     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.535575     Document Type: Conference Paper

References (11)

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