Improved manufacturability by OPC based on defocus data

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5042, Issue , 2003, Pages 135-143

  Thiele, Jörg ^a   Anke, Ines ^a   Haffner, Henning ^a   Semmler, Armin ^a  

^a INFINEON TECHNOLOGIES AG   (Germany)

Author keywords

Lithography; OPC; Optical proximity correction; Process window; Simulation

Indexed keywords

COMPUTER SIMULATION; DATA REDUCTION; LITHOGRAPHY; MATHEMATICAL MODELS; POLYSILICON; TRANSISTORS;

OPTICAL PROXIMITY CORRECTION (OPC);

INTEGRATED CIRCUIT MANUFACTURE;

EID: 0242693872     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.485251     Document Type: Conference Paper

References (3)

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2. W.Maurer, C.Dolainsky, J.Thiele, C.Friedrich, P.Karakatsanis, "Process proximity correction using an automated software tool", Proc. SPIE, vol.3334, pp. 245-253, 1998
3. W.Fischer, I.Anke, G.Schweeger, J.Thiele, "Simulation-based proximity correction in high volume DRAM production", Proc. SPIE, vol.4000, pp.1002-1009, 2000