Analysis of flare and its impact on low-k1 KrF and ArF lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4691, Issue 1, 2002, Pages 44-56

  La Fontaine, Bruno ^a   Dusa, Mircea ^b   Acheta, Alden ^a   Chen, Cinti ^a   Bourov, Anatoly ^c   Levinson, Harry ^a   Litt, Lloyd C ^c   Mulder, Melchior ^b   Seltman, Rolf ^a   Van Praagh, Judith ^b  

^a ADVANCED MICRO DEVICES   (United States)

^b ASM Lithography   (United States)

^c MOTOROLA INC   (United States)

Author keywords

Flare; Lithography; Modulation transfer function

Indexed keywords

IMAGING TECHNIQUES; LIGHT SCATTERING; MASKS; OPTICAL TRANSFER FUNCTION; PHASE SHIFT; SILICON WAFERS; ULTRAVIOLET RADIATION; WAVEFRONTS;

WAVEFRONT ERRORS;

PHOTOLITHOGRAPHY;

EID: 18644369746     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.474598     Document Type: Article

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