Evaluation of litel's in-situ interferometer (ISI) technique for measuring projection lens aberrations: An initial study

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5040 I, Issue , 2003, Pages 11-23

  De Bisschop, Peter ^a  

^a IMEC   (Belgium)

Author keywords

ISI; Lens aberrations; Litel; Technique evaluation

Indexed keywords

ABERRATIONS; LITHOGRAPHY; OPTICAL INSTRUMENT LENSES; SILICON WAFERS;

IN-SITU INTERFEROMETER; PROJECTION LENS ABERRATIONS;

INTERFEROMETERS;

EID: 0141833859     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.485525     Document Type: Conference Paper

References (4)

1. K. Rebitz, A. Smith, 'Characterizing exposure tool optics in the fab', Microlithography World, Summer 1999, p. 10
2. N. Farrar, A. Smith, D. Busath, D. Taitano, 'In-situ measurement of Lens Aberrations', Optical Microlithography XIII, ed. C. Progler, SPIE vol 4000 (2000) 18
3. B. Geh (Zeiss), private communication
4. R. Chung (Litel), private communication